Mikcell to Use a DWL 1100 for Production of Large Area Photomasks

Heidelberg, Germany (PRWEB) December 21, 2007

Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a DWL 1100 Maskless Lithography System from Mikcell Oy, Finland.

DWL 1100 maskless lithography system is capable of exposing photomasks of up to 1.1m x 1.1m, with features down to 1 micron. Among other things, it’s equipped with a semi automatic handling system, online data transfer, metrology and alignment system.

“Thanks to our investment in a DWL 1100 Laser Lithography System from Heidelberg Instruments, we will be able to start large-scale production and increase our market share. This will significantly strengthen our position in the international markets” says Elina Ruohonen-L


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Ibrar Ayyub

I am an experienced technical writer holding a Master's degree in computer science from BZU Multan, Pakistan University. With a background spanning various industries, particularly in home automation and engineering, I have honed my skills in crafting clear and concise content. Proficient in leveraging infographics and diagrams, I strive to simplify complex concepts for readers. My strength lies in thorough research and presenting information in a structured and logical format.

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