Torrance, CA (PRWEB) October 23, 2008
Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Printable Electronics Technology Centre (PETEC) located in Sedgefield, United Kingdom. The system will be used to provide a rapid turnaround on new designs of devices and circuits for plastic electronics. In addition, the system will be used as a tool to investigate the effects of distortion and misalignment on device performance in multilayer patterned devices on flexible substrates
The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.
About Heidelberg Instruments GmbH:
With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
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