Non-Toxic Nanolithography Using Pure Water

Honolulu, HI (PRWEB) August 23, 2006

(Nanowerk Spotlight) Conventionally, the fabrication of thin film nanostructures is primarily done by using selective etching or templating growth on a prepatterned resist and then performing lift-off. The solvents used in developing resist are typically toxic and add to the cost of lithographic processing. Recently, many environmentally friendly lithographic processes have been designed using either a water-based solution or supercritical carbon dioxide to develop the resist. A novel pure water developable spin-coatable lanthanum strontium manganese oxide (LSMO) resist has been developed by scientists in Taiwan. The use of pure water instead of organic or alkaline solvents would undoubtedly be not only environmentally desirable but also could greatly simplify the imaging process.

During semiconductor or thin film production, a conventional resist serves as passive masking function which is removed after the circuit is generated. The solvents used in developing resist are typically volatile and toxic, contributing to health hazards and environmental pollution.

Dr. Wei-Fang Su, professor in the Department of Materials Science and Engineering at Taiwan National University, explained a novel water-based process to Nanowerk: “We have developed a direct writing resist from the LSMO using its precursor solution. This solution is functioned as a resist via an auto ignition mechanism during electron beam exposure, and the patterned LSMO film can be developed using nontoxic and environmental friendly pure water.”

Read the full article on the Nanowerk website.

About Nanowerk: Nanowerk is a leading nanotechnology information portal. Apart from its unique Nanomaterial Database, with over 1,300 products from 90 suppliers, it provides the most complete nanotech events calendar; hundreds of links to universities, labs, researchers, associations, networks and international initiatives involved in nanotechnology; daily news; downloadable reports; and much more. The site includes a daily Spotlight section featuring Nanowerk-exclusive reviews and summaries of cutting-edge nanotechnology research by guest authors and Nanowerk editors. Nanowerk also publishes the nanoRISK newsletter a constructive contribution to the debate about the potential risks of nanotechnology.

By Michael Berger, Copyright 2006 Nanowerk LLC

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About The Author

Ibrar Ayyub

Ibrar Ayyub is an experienced technical writer with a Master's degree in computer science from BZU Multan University. He has written for various industries, mainly home automation, and engineering. He has a clear and simple writing style and is skilled in using infographics and diagrams. He is a great researcher and is able to present information in a well-organized and logical manner.

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