(PRWeb UK) July 6, 2010
Scientists from Singapore A*STARs Institute of Materials Research and Engineering (IMRE), University of Cambridge (UK) and Sungkyunkwan University (South Korea) have created metallic lines so thin and smooth that they can only be seen using powerful electron microscopes. This research will be published in the July issue of Advanced Functional Materials, the leading full-paper materials science journal.
At line widths of just 7 nm, their line width roughness , which are the variations in thickness along the line itself, stands at 2.9 nm, a value which is below the 2010 target of 3.2 nm and closer to 2011s target line width roughness of 2.8 nm indicated in the International Technology Roadmap for Semiconductors .
The ability to create such distinct lines and patterns on a sub-10 nm scale level is essential in the further miniaturisation of electronic components. Rough, undefined patterns and lines results in poorly made, energy-inefficient devices. The process is very delicate and precise because of the scale at which the work is done. For comparison, the width of the average human hair is 100
