Mikcell to Use a DWL 1100 for Production of Large Area Photomasks

Heidelberg, Germany (PRWEB) December 21, 2007

Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a DWL 1100 Maskless Lithography System from Mikcell Oy, Finland.

DWL 1100 maskless lithography system is capable of exposing photomasks of up to 1.1m x 1.1m, with features down to 1 micron. Among other things, it’s equipped with a semi automatic handling system, online data transfer, metrology and alignment system.

“Thanks to our investment in a DWL 1100 Laser Lithography System from Heidelberg Instruments, we will be able to start large-scale production and increase our market share. This will significantly strengthen our position in the international markets” says Elina Ruohonen-L

About The Author

Ibrar Ayyub

Ibrar Ayyub is an experienced technical writer with a Master's degree in computer science from BZU Multan University. He has written for various industries, mainly home automation, and engineering. He has a clear and simple writing style and is skilled in using infographics and diagrams. He is a great researcher and is able to present information in a well-organized and logical manner.

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