Rohm and Haas Gains Strong Market Traction with Defect and Slurry Reduction Groove Designs for CMP Pads : Products in Testing and Manufacturing in Leading-Edge, High Volume Fabs Worldwide
HSINCHU, Taiwan (PRWEB) September 10, 2008 Rohm and Haas’s defect reduction groove has already been adopted in high volume manufacturing (HVM) by customers in Europe, Korea, North America and Taiwan. While currently being used on the Rohm and Haas IC1000 AT CMP pad for the 90 nm process node and below, multiple customers are now […]