Voltaix Announces Expanded Production Capacity for Trimethylsilane (3MS)
North Branch, NJ (PRWEB) April 7, 2005 3MS is used by integrated circuit manufacturers for depositing low-k thin-film dielectric layers, such as carbon-doped silicate glass films, by plasma-enhanced CVD. The improved insulation of these layers helps to increase device speed and reduce power consumption. Voltaix is a reliable supplier of high-quality methylsilanes and silicon […]
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