Voltaix Announces Expanded Production Capacity for Trimethylsilane (3MS)

North Branch, NJ (PRWEB) April 7, 2005

3MS is used by integrated circuit manufacturers for depositing low-k thin-film dielectric layers, such as carbon-doped silicate glass films, by plasma-enhanced CVD. The improved insulation of these layers helps to increase device speed and reduce power consumption.


Voltaix is a reliable supplier of high-quality methylsilanes and silicon tetrafluoride, which is used for depositing fluorinated silicate gas films. As the demand for these high-performance precursors increases, Voltaix has increased capacity while also improving chemical specifications and detection limits.


Voltaix offers its customers a worldwide license covering the use of Voltaix┬ĺs methylsilanes with the right to make, have made, use, and offer to sell or import electronic devices in accordance with certain licensed patents assigned to Dow Corning Corporation. Further information about Voltaix is available at http://www.voltaix.com.


Voltaix is recognized worldwide for manufacturing high purity specialty gases and chemicals that enhance the performance of electronic and photonic devices. Its products include germane, silicon tetrafluoride, trimethylsilane (3MS), and Silcore® . Voltaix deploys proprietary manufacturing technologies to provide highly consistent products tailored to increase manufacturing yields, throughput, and device performance. (Silcore® is a trademark of ASM International, N.V.)


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Ibrar Ayyub

I am an experienced technical writer holding a Master's degree in computer science from BZU Multan, Pakistan University. With a background spanning various industries, particularly in home automation and engineering, I have honed my skills in crafting clear and concise content. Proficient in leveraging infographics and diagrams, I strive to simplify complex concepts for readers. My strength lies in thorough research and presenting information in a structured and logical format.

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