Voltaix

Voltaix Announces Expanded Production Capacity for Trimethylsilane (3MS)

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North Branch, NJ (PRWEB) April 7, 2005 3MS is used by integrated circuit manufacturers for depositing low-k thin-film dielectric layers, such as carbon-doped silicate glass films, by plasma-enhanced CVD. The improved insulation of these layers helps to increase device speed and reduce power consumption.   Voltaix is a reliable supplier of high-quality methylsilanes and silicon […]

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Voltaix Receives $12.5 Million in Financing from Intel Capital — Investment Highlights the Role of Materials Innovation in Thin Film Photovoltaic Market Estimated to Reach $6.7B by 2015

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Branchburg, NJ (PRWEB) July 31, 2008 Voltaix, a leading provider of materials that enhance the performance of semiconductor chips and solar cells, announced today that it has received $ 12.5 million in financing from Intel Capital, the global investment arm of Intel Corporation. The investment will accelerate the company’s manufacturing capacity expansion.   Voltaix manufactures

Voltaix Receives $12.5 Million in Financing from Intel Capital — Investment Highlights the Role of Materials Innovation in Thin Film Photovoltaic Market Estimated to Reach $6.7B by 2015 Read More »

Voltaix Announces Plans to Bring its Germane (GeH4) Production Technology to Korea via Agreement with Wonik Materials

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Seoul, South Korea and Branchburg, NJ (PRWEB) October 28, 2010 Voltaix, LLC, the acknowledged world market leader in the production of the germanium chemical vapor deposition (CVD) precursor, germane (GeH4), and Wonik Materials, Ltd., a rapidly growing South Korean Electronic Gas manufacturer and distributor, today signed an agreement which contemplates the construction of a 25

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